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SI-TECH, INC. provides a variety of silicon services.

The majority of these services are listed below.

Typical uniformity is less than or equal to five (5) per cent unless otherwise noted.

Please see our Products page for additional offerings

 

WAFER PROCESSING SERVICES

Prices effective January 16, 2017

 

OXIDE

               
     

2" - 4"

         

PROCESS

 

THICKNESS

50.8-100mm

5"/125mm

6"/150mm

8"/200mm

12"/300mm

 
                 

THERMAL OXIDE

  <= 10 KA  $8.00  $9.00  $  11.00  $  14.00  $  21.00
    10KA-20KA  $  11.50  $  12.00  $  13.00  $  16.00  $  30.00
    20KA-30KA  $  18.00  $  24.00  $  25.00  $  38.00  N/A 
    30KA-40KA  $  24.00  $  35.00  $  36.00  $  46.00  N/A 
    40KA-50KA  $  31.00  $  51.00  $  52.00  $  63.00  N/A 
    50KA-60KA  $  42.00  $  68.00  $  69.00  $  79.00  N/A 
                 

PECVD OXIDE

  < = 5 KA  $  22.50  $  25.00  $  28.75  $  41.00  $  95.00
    5 - 10 KA  $  28.75  $  34.25  $  35.00  $  47.25  $  107.00
    10 - 15 KA  $  35.00  $  37.50  $  41.00  $  53.50  $  120.00
    15 - 20 KA  $  41.00  $  43.75  $  47.00  $  60.00  $  126.00
                 

ANNEALING

 

 

 $14.00

 $16.00

 $16.00

 $18.00

 N/A

 
                 

NITRIDE

               
     

2" - 4"

         

PROCESS

 

THICKNESS

50.8-100mm

5"/125mm

6"/150mm

8"/200mm

12"/300mm

 
 

LPCVD  NITRIDE

  < 3 KA  $  16.00  $  23.25  $  24.25  $  29.50  $  69.75  
    3000-4500 A  $  22.25  $  25.00  $  25.00  $  40.00  N/A   

Furnace temperature = 820 C

 
   

   

           

LOW STRESS NITRIDE

  < = 5 KA  $  38.00  $  41.00  $  41.00  $  54.00  N/A   
    5 - 10 KA  $  53.00  $  56.00  $  56.00  $  69.00  N/A   
    10 - 15 KA  $  68.00  $  71.00  $  71.00  $  84.00  N/A   
    15 - 20 KA  $  83.00  $  86.00  $  86.00  $  99.00  N/A   

Furnace temperature = 820 C

 
                 

PECVD NITRIDE

 

< = 5 KA

 $  25.00  $  27.50  $  32.50  $  45.00  $  97.50  

Furnace temperature = 300-400 C

           
                 

LOW STRESS NITRIDE

 

< = 5 KA

 $  32.50  $  35.00  $  38.75  $  51.25  $  106.00  
   

5 -10 KA

 $  38.75  $  41.25  $  45.00  $  57.50  $  118.00  
   

10 - 20 KA

 $  45.00  $  47.50  $  51.25  $  63.75  $  131.00  

Furnace temperature = 300-400 C

           
                 

PHOTOLITHOGRAPHY

 
     

2" - 4"

         

PROCESS

 

THICKNESS

50.8-100mm

5"/125mm

6"/150mm

8"/200mm

12"/300mm

 
PHOTOLITHOGRAPHY                
.8um Stepped Masking  N/A   N/A   $  41.25  $  52.00  $  73.00  
Proximity Masking  $  19.00  N/A   $  27.00  $  37.00  $  58.00  
Checker Board Masking  N/A   N/A   $  20.00  $  25.25  $  40.00  
                 

SPUTTERING/DEPOSITION

 
     

2" - 4"

         

PROCESS

 

THICKNESS

50.8-100mm

5"/125mm

6"/150mm

8"/200mm

12"/300mm

 
 

PVD

               

Pure Aluminum (Al)

 

500-12 KA

 $   15.00  $  21.50  $  23.50  $  27.50  $   70.00  

Al/Copper (Al/Cu 0.5%)

 

500-12 KA

 $   15.00  $  21.50  $  23.50  $  27.50  $   70.00  

Al/Copper (Al/Cu 2.0%)

 

500-12 KA

 $   15.00  $  21.50  $  23.50  $  27.50  $   70.00  

Titanium (Ti)

 

200-3000 A

 $   16.00  $  24.00  $  25.00  $  31.00  $   80.00  

Titanium Nitride (TiN)

 

200-3000 A

 $   19.00  $  27.50  $  28.50  $  35.00  $   83.00  

Tungsten (W)

 

200-3000 A

 $   20.00  $  31.50  $  32.50  $  36.25  $   87.00  

Tantalum (Ta)

 

200-3000 A

 $   16.00  $  24.00  $  25.00  $  31.00  $   80.00  

Tantalum Nitride (TaN)

 

200-3000 A

 $   19.00  $  25.50  $  27.50  $  35.00  $   83.00  

Copper (Cu)

 

200-15 KA

 $   16.00  $  24.00  $  25.00  $  31.00  $   79.00  

Cromium (Cr)

 

200-2000 A

 $   20.00  $  31.50  $  32.50  $  36.50  $   87.00  
                 

SPUTTER DEPOSITION

               

Pure Aluminum (Al)

 

250-10 KA

 $   15.00  $  23.75  $  24.75  $  41.00  $   92.00  

Al/Copper (Al/Cu 0.5%)

 

250-10 KA

 $   15.00  $  23.75  $  24.75  $  41.00  $   92.00  

Copper (Cu)

 

250-10 KA

 $   16.00  $  27.50  $  28.50  $  42.00  $   93.50  

Titanium (Ti)

 

250-3000 A

 $   16.00  $  26.25  $  27.25  $  41.00  $   92.00  

Tantalum (Ta)

 

250-3000 A

 $   16.00  $  26.25  $  27.25  $  41.00  $   92.00  

Cromium (Cr)

 

250-3000 A

 $   19.00  $  31.25  $  32.25  $  46.00  $   98.00  

Tungsten (W)

 

250-3000 A

 $   19.00  $  31.25  $  32.25  $  46.00  $   98.00  

Titanium Nitride (TiN)

 

250-3000 A

 $   18.00  $  28.75  $  29.75  $  43.75  $   96.00  

Tantalum Nitride (TaN)

 

250-3000 A

 $   18.00  $  28.75  $  29.75  $  43.75  $   96.00  
                 

EVAPORATED METALS#

               

Aluminum (Al)

 

50- 5 KA

 $  850.00  N/A   $  875.00  $  925.00  N/A   

Copper (Cu)

 

50- 5 KA

 $  850.00  N/A   $  875.00  $  925.00  N/A   

Cromium (Cr)

 

50 - 3 KA

 $  900.00  N/A   $  925.00  $  975.00  N/A   

Tin (Sn)

 

50 - 3 KA

 $  900.00  N/A   $  925.00  $  975.00  N/A   

Titanium (Ti)

 

50 - 3 KA

 $  900.00  N/A   $  925.00  $  975.00  N/A   

Gold (Au)

 

50 - 3 KA

Call for pricing  Call for pricing  Call for pricing  Call for pricing  Call for pricing   

Platinum (Pt)

 

50 - 3 KA

Call for pricing  Call for pricing  Call for pricing  Call for pricing  Call for pricing   

# E-Beam Evaporation process. Prices are lot charges per batch of wafers. Call for more details.

 
                 
CVD GRAPHENE ON SILICON     Call for pricing Call for pricing Call for pricing Call for pricing Call for pricing  
                 

SILICON GERMANIUM

 

 

N/A

N/A

N/A

N/A

Call for pricing

 
                 

PECVD OXYNITRIDE

 

< = 5 KA

 $32.50

 $35.00

 $38.75

 $51.25

 $106.00

 
   

5 -10 KA

 $38.75

 $41.25

 $45.00

 $57.50

 $118.00

 
   

10 - 20 KA

 $45.00

 $47.50

 $51.25

 $63.75

 $131.00

 

Furnace temperature = 300-400 C

                 

POLY SI DEPOSITION

 

1 - 5 KA

 $   15.00  $  19.25  $  20.25  $  23.00  $   59.75  

 

 

5 - 10 KA

 $   18.00  $  23.00  $  24.00  $  29.00  $   69.00  

 

 

10 - 20 KA

 $   22.25  $  29.00  $  30.00  $  34.00  N/A   
Process temperature = 610 C
                 
AMORPHOUS SILICON*                
    200-500 A  $   22.50  $  33.00  $  34.00  $  39.00  $   13.55  
    500- 1.5KA  $   22.75  $  33.50  $  34.50  $  39.00  $   38.75  
* ALL DEPOSITED LPCVD THIN FILMS HAVE A 6mm EDGE EXCLUSION
                 

WAFER POLISHING AND RECLAIM

 
                 
     

2" - 4"

         

PROCESS

 

THICKNESS

50.8-100mm

5"/125mm

6"/150mm

8"/200mm

12"/300mm

 

WAFER POLISHING CLEAN

               
Silicon    

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Galium Arsenide    

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Germanium    

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WAFER POLISHING FULL

   

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DIFFUSION CLEAN      $   7.00  $  8.00  $  8.50  $  10.00  $   19.50  
                 

STRIP THERMAL/CVD OXIDE*

     $   6.50  $  7.00  $  8.00  $  9.00  $   16.00  
                 

STRIP POLYSILICON/NITRIDE*

     $   10.00  $  13.00  $  14.00  $  17.00  $   31.00  
                 

PHOTORESIST STRIP*

     $   6.50  $  7.00  $  8.00  $  9.00  $   16.00  

*Minimum 100 wafers

               
                 
LASER MARK     Call for pricing Call for pricing Call for pricing Call for pricing Call for pricing  
                 

WAFER RECLAIM

 

 

Call for pricing

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EPI WAFERS

  EPI PRICES ARE QUOTED AS PER CUSTOMER SPECIFICATIONS 
                 

25 wafer minimum each process

       
                 

5 PERCENT DISCOUNT FOR PURCHASES OF 200 TO 500 WAFERS.

 
                 

10 PERCENT DISCOUNT FOR PURCHASES  OF GREATER THAN 500 WAFERS.

 
                 

Prices subject to change without notice

 
                 
                 
 
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